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PS-EIP: Robust Photometric Stereo Based on Event Interval Profile
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Proposes PS-EIP, a non-deep-learning event-based photometric stereo method that fits per-pixel surface normals to a time-series event interval profile and removes shadow/specular outliers with shape-based masks.
Problem
Event-based photometric stereo (EventPS) treats each event interval independently, making normal recovery sensitive to noise, shadows, and non-Lambertian reflections.
Approach
Model the inverse event intervals as a time-series Event Interval Profile (time derivative of log intensity), fit the theoretical profile per pixel to recover normals, and exclude outlier temporal regions (collapsed events, specularity, cast shadow) using shape-based masks.
Key results
- PS-EIP achieves an average MAE of 8.12 degrees over all 3D-printed objects versus 13.66 degrees for EventPS.
- On sphere-based shapes, average MAE is 6.72 degrees for the proposed method versus 11.87 degrees for EventPS.
- On complex shapes, average MAE is 9.66 degrees for the proposed method versus 15.64 degrees for EventPS.
Measured effects reported in the paper
| What was changed | Where | Measured | Effect |
|---|---|---|---|
| Use an event-interval time-series profile instead of treating intervals independently | PS-EIP · Sphere-based objects | MAE: 11.87° -> 6.72° | Helped |
| Use an event-interval time-series profile instead of treating intervals independently | PS-EIP · Complex shapes | MAE: 15.64° -> 9.66° | Helped |
| Use an event-interval time-series profile instead of treating intervals independently | PS-EIP · All 3D-printed objects | MAE: 13.66° -> 8.12° | Helped |
| Add shape-based masks to exclude distorted event-profile regions (ablation) | PS-EIP · Glossy, Pole, and MulRefs | MAE | Helped |
| Increase the number of measurements averaged (ablation) | PS-EIP · Diffuse, Glossy, and Pole | MAE | Helped |
| Increase averaging beyond 30 measurements (ablation) | PS-EIP · Diffuse, Glossy, and Pole | MAE | No clear effect |
| Increase ring-light rotational frequency (ablation) | PS-EIP · Diffuse | MAE | Mixed |
| Apply azimuth-offset correction (ablation) | PS-EIP · Diffuse | MAE | Helped |
Surprising findings
- Robust results are obtained without deep learning, outperforming the deep-learning variant EventPS-FCN.
Limitations
- Assumes distant light source and orthographic camera.
- Inter-reflections and subsurface scattering are not modeled, causing errors in concave regions.
- Constant event thresholds assumed; threshold variation affects profiles and requires averaging over 30 measurements.
Experimental setup
Datasets: real event data from 21 3D-printed objects
Benchmarks: 3D-printed known-shape objects (sphere-based and complex shapes)
Metrics: mean angular error (MAE)
Baselines: EventPS-FCN EventPS
Builds on: EventPS Woodham photometric stereo
Closest papers by meaning
- EventPS: Real-Time Photometric Stereo Using an Event Camera (CVPR 2024 · similarity 0.91)
- EventPSR: Surface Normal and Reflectance Estimation from Photometric Stereo Using an Event Camera (CVPR 2025 · similarity 0.87)
- Differentiable Display Photometric Stereo (CVPR 2024 · similarity 0.84)
- MVCPS-NeuS: Multi-view Constrained Photometric Stereo for Neural Surface Reconstruction (CVPR 2024 · similarity 0.83)
- SfPUEL: Shape from Polarization under Unknown Environment Light (NeurIPS 2024 · similarity 0.82)
- EAG3R: Event-Augmented 3D Geometry Estimation for Dynamic and Extreme-Lighting Scenes (NeurIPS 2025 · similarity 0.82)
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