Research map / Image generation / Text-to-image diffusion
Learning to Generate Multiple Objects from Dense and Occluded Layouts
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Proposes layout-aware attention biases and an amodal-balanced loss (AIBL) that upweights occluded instances, improving object counting in dense overlapping scenes for a DiT-based text-to-image model, and introduces the OverlapDepth-45K benchmark.
Problem
Text-to-image diffusion models fail to generate correct object counts in dense scenes, where overlapping instances merge and heavily occluded objects receive weak training gradients.
Approach
Injects depth-ordered region-identity attention biases (cohesion within instance, separation across instances, boosted in overlap zones) into DiT attention logits, and reweights the per-pixel flow-matching loss by an amodal-to-visible area ratio per instance, mean-normalized to keep gradient scale fixed.
Key results
- On OverlapDepth-45K, AIBL reaches 15.32% exact match and RMSE 5.99, versus 3DIS at 12.88% and RMSE 6.34 among layout baselines.
- Adding AIBL to basic layout attention reduces RMSE from 9.26 to 5.99 (reported 35.3% reduction).
- On the T2I-Compbench counting subset (100-image human eval), the method reaches 65% accuracy versus 48% for CountGen.
Surprising findings
- The layout-only baseline marginally outperforms AIBL in the highest density bin (23+ objects), 8.7% vs 8.3%.
- Setting gamma=1.0 causes RMSE to approach the layout-only baseline, showing that stronger occlusion boosting hurts.
Limitations
- Density saturation: latent resolution limits force feature overlap in extremely packed scenes.
- Category bias: thin or articulated objects (e.g., umbrellas) are harder to render.
- OverlapDepth-45K is entirely synthetic, risking domain shift to real images.
Experimental setup
Datasets: OverlapDepth-45K MS-COCO Visual Genome
Benchmarks: OverlapDepth-45K T2I-Compbench CoCoCount
Metrics: Exact Match accuracy relative tolerance accuracy (±10%, ±20%) MAE RMSE counting score
Baselines: FLUX.2-Klein-4b SDXL-Turbo GLIGEN MIGC 3DIS SDXL Repeated Object Reason Out Your Layout DALL-E 3 Random masks + BoundedAttn Counting Guidance CountGen (Make-It-Count)
Builds on: GLIGEN MIGC 3DIS rectified flow matching FLUX.2-Klein
Closest papers by meaning
- OverLay++: Dense-Overlap Layout-to-Image Generation Dataset (NeurIPS 2026 · similarity 0.88)
- OverLayBench: A Benchmark for Layout-to-Image Generation with Dense Overlaps (NeurIPS 2025 · similarity 0.87)
- InstanceDiffusion: Instance-level Control for Image Generation (CVPR 2024 · similarity 0.86)
- Disentangled 3D Scene Generation with Layout Learning (ICML 2024 · similarity 0.86)
- InstanceAssemble: Layout-Aware Image Generation via Instance Assembling Attention (NeurIPS 2025 · similarity 0.86)
- ROICtrl: Boosting Instance Control for Visual Generation (CVPR 2025 · similarity 0.85)
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